The 66th JSAP Spring Meeting, 2019

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6 Thin Films and Surfaces » 6.4 Thin films and New materials

[10a-W323-1~9] 6.4 Thin films and New materials

Sun. Mar 10, 2019 9:00 AM - 12:15 PM W323 (W323)

Tetsuo Tsuchiya(AIST)

10:00 AM - 10:15 AM

▲ [10a-W323-5] Deposition temperature dependence on N-doped LaB6 thin film utilizing RF sputtering

〇(D)KyungEun Park1, Yuki Komatsu1, Yasutaka Maeda1, Shun-ichiro Ohmi1 (1.Tokyo Tech)

Keywords:N-doped LaB6, RF sputtering