The 66th JSAP Spring Meeting, 2019

Presentation information

Symposium (Oral)

Symposium » Progress of characterization and monitoring techniques that reveal fundamental of light process

[10p-M114-1~12] Progress of characterization and monitoring techniques that reveal fundamental of light process

Sun. Mar 10, 2019 1:30 PM - 6:15 PM M114 (H114)

Daisuke Nakamura(Kyushu Univ.)

1:30 PM - 2:00 PM

[10p-M114-1] Analysis of curing behavior of UV curable resin for stereolithography combined with 355 nm laser and high-speed FT-IR

Kentaro Taki1 (1.Kanazawa Univ.)

Keywords:Stereolithography

In this presentation, an optical system combining 355 nm laser, galvanometer mirror and high-speed FT-IR was newly constructed and time change of the reaction rate of oxetane, epoxy, acrylic ternary UV curable resin for stereolithography was measured. As a result, it became clear that the reaction rate and reaction rate increased in the order of acrylic> oxetane> epoxy.