[10p-PA8-1~39] 17 Nanocarbon Technology (Poster)

[10p-PA8-32] Dose dependence of magnetoresistance in helium-ion-irradiated graphene

〇Shu Nakamura¹, Takuya Iwasaki², Manoharan Muruganathan¹, Masashi Akabori¹, Yoshifumi Morita³, Satoshi Moriyama², Shinichi Ogawa⁴, Yutaka Wakayama², Hiroshi Mizuta^1,5, Shu Nakaharai² (1.JAIST, 2.NIMS, 3.Gunma Univ., 4.AIST, 5.Hitachi Camb. Lab)

Keywords:Graphene, locarization, Magnetoresistance