The 66th JSAP Spring Meeting, 2019

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Symposium (Oral)

Symposium » Pioneering of Frontier technology for metal oxide novel device I -from thin film fabrication to device creation -

[10p-W241-1~8] Pioneering of Frontier technology for metal oxide novel device I -from thin film fabrication to device creation -

Sun. Mar 10, 2019 1:30 PM - 5:15 PM W241 (W241)

Kosaku Shimizu(Nihon Univ.), Mutsumi Kimura(Ryukoku Univ.)

3:30 PM - 4:00 PM

[10p-W241-5] Electronic structures, materials design, and growth conditions for oxide semiconductors and devices

〇Toshio Kamiya1,2, Hideo Hosono1,2 (1.MSL, Tokyo Tech, 2.MCES, Tokyo Tech)

Keywords:oxide semiconductor