4:45 PM - 5:00 PM
[10p-W321-14] Preparation of Cu2SnS3 thin film using mist CVD method
Keywords:mist CVD, Cu2SnS3(CTS)
Preparation of semiconductor solar cells thin films using non-vacuum process and containing rare metals are causes of high cost. In this research, rare metal free Cu2SnS3(CTS) thin films were fabricated using mist chemical vapor deposition (mist CVD) method which don’t require vacuum apparatus. The mist solution was prepared by dissolved Tin chloride(SnCl4) and Copper chloride(CuCl2) into pure water as a solvent with 0.4 M. Then, it was deposited on alkali-free glass(Eagle) substrates heated at 400°C to prepare Cu-Sn (CT) precursors. Finally, the prepared CT precursors were heated a sulfur-nitrogen containing atmosphere (H2S(3%)+N2) in order to prepare CTS thin films. X-ray powder diffraction (XRD) of the samples demonstrate the presence of the monoclinic phase of CTS with peaks of (200), (131), (-131), and (-333). However, a secondary phase of SnO2 was observed from samples which deposited around the mist blowout(Upstream). In fact, it is considered that the replacement of Oxide to Sulfur by heating in sulfur-nitrogen containing atmosphere was not succesfully occurred. Therefore, improvement of sulfurization condition is necessary.