The 66th JSAP Spring Meeting, 2019

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Code-sharing session » 【CS.5】Code-sharing Session of 6.1 & 13.3 & 13.5

[10p-W631-1~12] CS.5 Code-sharing Session of 6.1 & 13.3 & 13.5

Sun. Mar 10, 2019 1:45 PM - 5:00 PM W631 (W631)

Masaharu Kobayashi(Univ. of Tokyo), Takao Shimizu(Tokyo Tech), Shosuke Fujii(Toshiba Memory)

2:45 PM - 3:00 PM

[10p-W631-5] Mechanism of ferroelectric phase reduction in HfO2 due to oxidizing thermal treatment

〇Takeaki Yajima1, Yuki Mori1, Tomonori Nishimura1, Akira Toriumi1 (1.The Univ. of Tokyo)

Keywords:ferroelectricity, phase transition, HfO2

The competition between the ferroelectric phase and the paraelectric (monoclinic) phase during the thermal treatment is investigated in poly-crystalline Ge-doped HfO2 thin films, in order to elucidate the mechanism of ferroelectric phase reduction. The results indicate the ferroelectric phase undergoes a slight lattice deformation by oxidization, and then induces the transition to monoclinic phase at temperature below 600 ℃.