The 66th JSAP Spring Meeting, 2019

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Oral presentation

6 Thin Films and Surfaces » 6.3 Oxide electronics

[10p-W641-1~17] 6.3 Oxide electronics

Sun. Mar 10, 2019 1:45 PM - 6:15 PM W641 (W641)

Kentaro Kinoshita(Tokyo Univ. of Sci.), Yusuke Nishi(Kyoto Univ.)

1:45 PM - 2:00 PM

[10p-W641-1] Post processes influenced to NiO thin film and NiO/insulator for electronic devices

〇Hiroaki Okada1, Zehua Wang1, Ryo Tanuma1, Mutsumi Sugiyama1,2 (1.Tokyo Univ. of Sci., 2.RIST)

Keywords:NiO, RF sputter, TFT