[11a-W611-1~11] 8.4 Plasma life sciences

△ [11a-W611-5] Improvement in Suppression Effect of Plasma-Exposed-Solution with OH Radicals Generated by Gas-Liquid Interface Plasma

〇(M2)Kenji Nihei¹, Keisuke Takashima¹, Toshiro Kaneko¹ (1.Graduate School of Engineering, Tohoku Univ.,)

Keywords:plasma exposed solution, gas-liquid interface plasma

A plasma jet device spraying Plasma-Exposed-Solution has been developed, which is expected to enable to generate high concentration of liquid phase short-lived reactive species by the direct contact with the plasma and to transport the generated reactive species to target objects in a short time. The germination suppression effect can be improved by additionally supplying reactive nitrogen species in the gas phase. This is because the reactive nitrogen species uptake is promoted by the high concentration OH radicals generated in the gas-liquid interface and as a result, the production of the short-lived reactive species in the liquid phase having the germination suppression effect is also promoted.