The 66th JSAP Spring Meeting, 2019

Presentation information

Oral presentation

6 Thin Films and Surfaces » 6.3 Oxide electronics

[11a-W641-1~10] 6.3 Oxide electronics

Mon. Mar 11, 2019 9:00 AM - 11:45 AM W641 (W641)

Hisashi Shima(AIST), Mitsunori Kitta(AIST)

9:30 AM - 9:45 AM

[11a-W641-3] Fabrication of p-type CoGa2O4 thin film and its photoelectrochemical properties

〇(M1)Jiaxin Chen1, Hang Zhou1, Munetoshi Seki1, Hitoshi Tabata1 (1.University of Tokyo)

Keywords:p-type semiconductor, photoelectrochemical

The photoelectrical properties of transition metal oxide have a lot of applications such as solar cells and water splitting by sunlight. So far, a number of studies have been done on the photoelectrochemical properties of n-type oxide semiconductors like Fe2O3 and TiO2 for the application to the solar water splitting because of their good stability in water and high responsiveness to visible light. On the contrary, the photoelectrochemical properties of p-type semiconductor materials are not reported a lot because they are unstable and sensible to photocorrosion.
In this study, we focused on a p-type semiconductor oxide CoGa2O4 (CGO). Thin films of CGO were fabricated using a pulsed laser deposition (PLD) technique.