The 66th JSAP Spring Meeting, 2019

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13 Semiconductors » 13.4 Si processing /Si based thin film / MEMS / Equipment technology

[11a-W934-1~11] 13.4 Si processing /Si based thin film / MEMS / Equipment technology

Mon. Mar 11, 2019 9:00 AM - 11:45 AM W934 (W934)

Hiromu Ishii(Toyohashi Univ. of Tech.), Minoru Sasaki(Toyota Tech. Inst.)

10:30 AM - 10:45 AM

[11a-W934-7] Origin of weak Fermi-level pinning at silicide/Si interface

〇Tomonori Nishimura1, Luo Xuan1, Yajima Takeaki1, Toriumi Akira1 (1.The Univ. of Tokyo)

Keywords:Fermi level pinning, Silicide