The 66th JSAP Spring Meeting, 2019

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8 Plasma Electronics » 8.5 Plasma phenomena, emerging area of plasmas and their new applications

[11p-W323-1~15] 8.5 Plasma phenomena, emerging area of plasmas and their new applications

Mon. Mar 11, 2019 1:45 PM - 5:45 PM W323 (W323)

Satoshi Uchida(Tokyo Metropolitan Univ.), Kazuhiro Takahashi(Muroran Inst. of Tech.)

2:30 PM - 2:45 PM

[11p-W323-4] Efficient microwave injection into overdense plasma supported by negative-permeability resonant metamaterial

〇Akinori Iwai1, Yoshihiro Nakamura1, Osamu Sakai2 (1.Kyoto Univ., 2.Univ. Shiga Pref.)

Keywords:microwave plasma, metamaterial, negative index