The 66th JSAP Spring Meeting, 2019

Presentation information

Oral presentation

8 Plasma Electronics » 8.5 Plasma phenomena, emerging area of plasmas and their new applications

[11p-W323-1~15] 8.5 Plasma phenomena, emerging area of plasmas and their new applications

Mon. Mar 11, 2019 1:45 PM - 5:45 PM W323 (W323)

Satoshi Uchida(Tokyo Metropolitan Univ.), Kazuhiro Takahashi(Muroran Inst. of Tech.)

3:15 PM - 3:30 PM

[11p-W323-7] Ammonia production through P/L reaction with VUV/UV irradiation

Tatsuya Sakakura1, Naoya Murakami1, Yoshiyuki Takatsuji1, Tetsuya Haruyama1 (1.Kyutech)

Keywords:ammonia, P/L reaction, radical

We have studied and developed the plasma/liquid interface reaction (P/L reaction) that can produce ammonia from the air (nitrogen source) and the water (hydrogen source) at ambient temperature and pressure, without any catalysts. It is important to form a gas phase which can react easily with water. The activated nitrogen produced by plasma is involved in the production amount of ammonia. In this study, the P/L reaction has been enhanced Ultraviolet (UV) irradiation of water phase surface. Nitrogen plasma/water interface reaction locus can produce ammonia. Vacuum Ultraviolet (VUV) irradiated interface reaction locus increased ammonia production. In a spin trap electron spin resonance (st-ESR) experiment, atomic H (H·) has been produced a lot by UV irradiation, especially by VUV irradiation. The derived H· effectively enhanced the P/L reaction rate.