2019年第66回応用物理学会春季学術講演会

講演情報

一般セッション(口頭講演)

17 ナノカーボン » 17.3 層状物質

[11p-W521-1~18] 17.3 層状物質

2019年3月11日(月) 13:45 〜 18:30 W521 (W521)

中野 匡規(東大)、川那子 高暢(東工大)

17:00 〜 17:15

[11p-W521-13] Sulfur vacancies degrade interface at valence band side in MoS2 FET

Nan Fang1、Kosuke Nagashio1 (1.Tokyo Univ.)

キーワード:Sulfur vacancies, MoS2, valance band

Although stable p-type 2D-FET is required for complementary transistor operation, the transistor performance of defect-related p-type 2D channels, such as WSe2, SnS2 and so on, is generally low, compared with widely studied n-type MoS2 FET. Here, Nb doped p-type MoS2 crystals are available now. In this study, we study the hole transport of Nb-doped MoS2 FET in order to reveal the interface states (Dit) at valance band (VB) side.