The 66th JSAP Spring Meeting, 2019

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13 Semiconductors » 13.7 Compound and power electron devices and process technology

[9a-M121-1~11] 13.7 Compound and power electron devices and process technology

Sat. Mar 9, 2019 9:30 AM - 12:30 PM M121 (H121)

Taketomo Sato(Hokkaido Univ.)

9:45 AM - 10:00 AM

[9a-M121-2] Photoemission Study of HfSiOx/GaN Structure

〇Akio Ohta1, Makihara Katunori1, Toshihide Nabatame2, Koji Shiozaki1, Seiichi Miyazaki1 (1.Nagoya Univ., 2.NIMS.)

Keywords:Photoemission Study, Hf-Silicate