The 66th JSAP Spring Meeting, 2019

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6 Thin Films and Surfaces » 6.4 Thin films and New materials

[9p-PA1-1~28] 6.4 Thin films and New materials

Sat. Mar 9, 2019 1:30 PM - 3:30 PM PA1 (PA)

1:30 PM - 3:30 PM

[9p-PA1-22] Internal Stress of Low Refractive Index SiO2 Optical Thin Films by Electron Beam and Sputtering

〇Kei Yoshizawa1, Tsuno Yoshiki2, Syou Ro2, Hiroshi Murotani1 (1.Tokai Univ., 2.Grad. Sch. of Eng., Tokai Univ.)

Keywords:combination coating, SiO2, internal stress