[9p-S223-1~12] 7.3 Micro/Nano patterning and fabrication

[9p-S223-10] Observation of Fluorescence Inclination Moiré Fringes Generated from Fluorescent Liquid between Mold and Substrate

〇Takuma Yoshida¹, Kento Ochiai¹, Akiko Onuma¹, Kazue Sutou¹, Shunya Ito¹, Takahiro Nakamura¹, Masaru Nakagawa¹ (1.IMRAM, Tohoku Univ.)

Keywords:UV nanoimprint lithography, alignment, fluorescence inclination moire fringes

In UV nanoimprint lithography, high precision alignment of an imprint mold to a substrate is important to fabricate resist patterns at a position predetermined on the substrate. Our group proposed additive-type “fluorescence moiré alignment” using a fluorescent liquid in UV nanoimprinting. In this study, we designed couples of line and space patterns for multiplicative-type inclination moiré alignment to demonstrate whether additive-type inclination fluorescence moiré fringes express angular information.