Oral presentation

[9p-S223-1~12] 7.3 Micro/Nano patterning and fabrication

Sat. Mar 9, 2019 1:45 PM - 5:00 PM S223 (S223)

Jiro Yamamoto(HITACHI), Jun Taniguchi(Tokyo Univ. of Sci.)

△：Presentation by Applicant for JSAP Young Scientists Presentation Award
▲：English Presentation
▼：Both of Above
No Mark：None of Above

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1:45 PM - 2:00 PM

[9p-S223-1] Investigation on Optics for Printing Large Patterns Using Maskless Inside Lithography

〇Toshiyuki Horiuchi¹, Kousuke Akitani¹, Kazumi Imahashi¹, Yuta Suzuki¹, Jun-ya Iwasaki¹, Akira Yanagida¹, Hiroshi Kobayashi¹ (1.Tokyo Denki Univ.)

2:00 PM - 2:15 PM

[9p-S223-2] Evolutional OPC as DTCO :
LWR and Sliming Effects on SNM of Fin-Trs SRAM by Computational Prediction

〇Kazuya Kadota¹ (1.NanoscienceLab)

2:15 PM - 2:30 PM

[9p-S223-3] Modeling of exposure and development processes in EUV lithography

〇Akira Sasaki¹, Ishino Masahiko¹, Nishikino Masaharu¹, Maekawa Yasunari¹ (1.QST)

2:30 PM - 2:45 PM

[9p-S223-4] Synthesis of Silver Nanoparticle and Nanofabrication in Polymeric Films Induced by Electron Beam

〇Hiroki Yamamoto¹, Kozawa Takahiro², Tagawa Seiichi², Marignier Jean-Louis³, Mostafavi Mehran³, Belloni Jacqueline³ (1.QST, 2.ISIR, Osaka Univ., 3.Univ. Paris-Sud)

2:45 PM - 3:00 PM

△ [9p-S223-5] Direct Metal Nano-Patterning by Electron Beam Irradiation

〇(M2)Keita Mizuno¹, Hiroko Kominami¹, Atsushi Ono¹ (1.Shizuoka Univ.)

3:00 PM - 3:15 PM

[9p-S223-6] Stochastic simulation of pattern formation for chemically amplified resist in electron beam lithography

〇(D)Masanori Koyama¹, Masamitsu Shirai¹, Hiroaki Kawata¹, Yoshihiko Hirai¹, Masaaki Yasuda¹ (1.Osaka Pref. Univ.)

3:30 PM - 3:45 PM

[9p-S223-7] Graphoepitaxy of lamellar-forming block copolymers by coarse-grained molecular dynamics simulations

〇Toru Yamaguchi¹, Hirotaka Tanaka¹, Akira Fujiwara¹ (1.NTT BRL)

3:45 PM - 4:00 PM

[9p-S223-8] Development of Organic-Inorganic Hybrid Resins for Replica Molds with High Mechanical Strength

〇Shunya Ito¹, Takahiro Nakamura¹, Masaru Nakagawa¹ (1.IMRAM, Tohoku Univ.)

4:00 PM - 4:15 PM

[9p-S223-9] Study on 3-D profile correction for resist shrinkage in nanoimprint lithography

Kenta Watanabe¹, 〇Hiroki Sunagawa¹, Ryunosuke Yamashita², Masaaki Yasuda¹, Yuki Onishi², Hiroaki Kawata¹, Yoshihiko Hirai¹ (1.Osaka Pref.Univ, 2.Tokyo Tech.)

4:15 PM - 4:30 PM

[9p-S223-10] Observation of Fluorescence Inclination Moiré Fringes Generated from Fluorescent Liquid between Mold and Substrate

〇Takuma Yoshida¹, Kento Ochiai¹, Akiko Onuma¹, Kazue Sutou¹, Shunya Ito¹, Takahiro Nakamura¹, Masaru Nakagawa¹ (1.IMRAM, Tohoku Univ.)

4:30 PM - 4:45 PM

[9p-S223-11] Preparation of Hydrophobic and Oleophobic Surfaces by Nanoimprinting Using Anodic Porous Alumina Molds

〇Takashi Yanagishita¹, Naoto Shirano¹, Hideki Masuda¹ (1.Tokyo Metropolitan Univ.)

4:45 PM - 5:00 PM

[9p-S223-12] Mask Fabrication for Quartz Glass Deep Etching by use of Electroless Ni Plating

Ryuichirou Oohoto¹, 〇Hiroaki Kawata¹, Masaaki Yasuda¹, Yoshihiko Hirai¹ (1.Osaka Pre Univ.)

Sessions

7 Beam Technology and Nanofabrication » 7.3 Micro/Nano patterning and fabrication