The 66th JSAP Spring Meeting, 2019

Presentation information

Oral presentation

7 Beam Technology and Nanofabrication » 7.3 Micro/Nano patterning and fabrication

[9p-S223-1~12] 7.3 Micro/Nano patterning and fabrication

Sat. Mar 9, 2019 1:45 PM - 5:00 PM S223 (S223)

Jiro Yamamoto(HITACHI), Jun Taniguchi(Tokyo Univ. of Sci.)

3:45 PM - 4:00 PM

[9p-S223-8] Development of Organic-Inorganic Hybrid Resins for Replica Molds with High Mechanical Strength

Shunya Ito1, Takahiro Nakamura1, Masaru Nakagawa1 (1.IMRAM, Tohoku Univ.)

Keywords:UV nanoimprint lithography, replica mold, organic-inorganic hybrid resin

In UV nanoimprint lithography, the fabrication of highly reliable replica resin molds with high transmittance of UV light is necessary for reducing the process cost. Because organic replica resin molds show lower mechanical strength than inorganic fused silica molds, the improvement of mechanical strength of replica resin molds is required to give the mold performances of stable critical dimension and lifetime during repeated molding and demolding processes. Here, we studied organic-inorganic hybrid resins containing silica nanoparticles for fabricating hybrid replica molds with high mechanical strength.