The 66th JSAP Spring Meeting, 2019

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7 Beam Technology and Nanofabrication » 7.3 Micro/Nano patterning and fabrication

[9p-S223-1~12] 7.3 Micro/Nano patterning and fabrication

Sat. Mar 9, 2019 1:45 PM - 5:00 PM S223 (S223)

Jiro Yamamoto(HITACHI), Jun Taniguchi(Tokyo Univ. of Sci.)

4:00 PM - 4:15 PM

[9p-S223-9] Study on 3-D profile correction for resist shrinkage in nanoimprint lithography

Kenta Watanabe1, 〇Hiroki Sunagawa1, Ryunosuke Yamashita2, Masaaki Yasuda1, Yuki Onishi2, Hiroaki Kawata1, Yoshihiko Hirai1 (1.Osaka Pref.Univ, 2.Tokyo Tech.)

Keywords:nanoimprint lithography