Takayuki Hagiwara

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Speaker, Author, Co-Author

Fri. Sep 11, 2020 8:30 AM - 11:15 AM Z10

Oral presentation
| 13 Semiconductors
| 13.3 Insulator technology

[11a-Z10-1~10] 13.3 Insulator technology

9:00 AM - 9:15 AM

[11a-Z10-3] Properties of low-temperature ALD Al₂O₃ film by high purity ozone

〇Takayuki Hagiwara¹, Ayaka Abe¹, Naoto Kameda¹, Ken Nakamura², Hidehiko Nonaka² (1.MEIDEN NPI, 2.AIST)