Kazumasa Nemoto

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Speaker, Author, Co-Author

Thu. Sep 10, 2020 8:45 AM - 11:30 AM Z10

Oral presentation
| 13 Semiconductors
| 13.4 Si processing /Si based thin film / MEMS / Equipment technology

[10a-Z10-1~10] 13.4 Si processing /Si based thin film / MEMS / Equipment technology

11:00 AM - 11:15 AM

[10a-Z10-9] Chamber pressure control for reducing the particles

〇Kazumasa Nemoto¹, Takashi Yajima¹, Kazuhiro koga², Sommawan Khumpuang^1,2, Shiro Hara^1,2 (1.AIST, 2.Minimal Fab)