Shuhei Nakamichi

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Speaker, Author, Co-Author

Thu. Sep 10, 2020 8:45 AM - 11:30 AM Z10

Oral presentation
| 13 Semiconductors
| 13.4 Si processing /Si based thin film / MEMS / Equipment technology

[10a-Z10-1~10] 13.4 Si processing /Si based thin film / MEMS / Equipment technology

10:45 AM - 11:00 AM

[10a-Z10-8] Study of Coating Process for Thick Photo-resist using Minimal Fab Coater

〇Shuhei Nakamichi¹, Hiroyuki Tanaka², Fumito Imura², Shuichi Noda², Sommawan Khumpuang^1,2, Shiro Hara^1,2 (1.Minimal Fab, 2.AIST)