9:30 AM - 9:45 AM
△ [10a-Z24-4] Fabrication of MFSFET with ferroelectric non-doped HfO2 utilizing Hf interfacial layer
〇Masaki Hayashi1, Masakazu Kataoka1, Min Gee Kim1, Shun-ichiro Ohmi1 (1.Tokyo Tech)
Thu. Sep 10, 2020 8:45 AM - 12:00 PM Z24
9:30 AM - 9:45 AM
〇Masaki Hayashi1, Masakazu Kataoka1, Min Gee Kim1, Shun-ichiro Ohmi1 (1.Tokyo Tech)