Hirokazu Fujiwara

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Speaker, Author, Co-Author

Fri. Sep 11, 2020 8:30 AM - 11:45 AM Z09

Oral presentation
| 13 Semiconductors
| 13.5 Semiconductor devices/ Interconnect/ Integration technologies

[11a-Z09-1~12] 13.5 Semiconductor devices/ Interconnect/ Integration technologies

9:30 AM - 9:45 AM

△ [11a-Z09-5] Demonstration of Surrounding Gate Vertical-Channel FET with Gate Length of 40 nm Using BEOL Process Compatible In-Al-Zn Oxide Channel

〇Hirokazu Fujiwara¹, Yuta Sato¹, Nobuyoshi Saito¹, Tomomasa Ueda¹, Keiji Ikeda¹ (1.Kioxia Corp.)