Tomoki Oku

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Speaker, Author, Co-Author

Fri. Sep 11, 2020 8:30 AM - 11:15 AM Z10

Oral presentation
| 13 Semiconductors
| 13.3 Insulator technology

[11a-Z10-1~10] 13.3 Insulator technology

9:15 AM - 9:30 AM

[11a-Z10-4] Penetration barrier of alkaline earth metal and copper group ions into SiO₂ and Si₃N₄ films

〇Tomoki Oku¹, Totsuka Masahiro¹, Sasaki Hajime¹ (1.Mitsubishi Electric)