Takashi Hamano

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Speaker, Author, Co-Author

Fri. Sep 11, 2020 1:30 PM - 4:15 PM Z03

Oral presentation
| 8 Plasma Electronics
| 8.2 Plasma deposition of thin film, plasma etching and surface treatment

[11p-Z03-3~12] 8.2 Plasma deposition of thin film, plasma etching and surface treatment

2:00 PM - 2:15 PM

△ [11p-Z03-5] Characterization of Plasma Process-Induced Defect States in SiO₂ Films Using Transient Current Analysis

〇Takashi Hamano^1,2, Keiichiro Urabe¹, Koji Eriguchi¹ (1.Kyoto Univ., 2.JSPS Research Fellow)