11:00 AM - 11:15 AM [8a-Z05-8] Fabrication and structural analysis of high-nitrogen containing a-CNx:H thin films using radio-frequency plasma CVD of the C6 organic compound-N2 gas mixture 〇Yoshinori Karo1, Haruhiko Ito1, Hidetoshi Saitoh1 (1.Nagaoka Univ. of Tech.)