Oral presentation

[9p-Z21-1~10] 8.3 Plasma nanotechnology

Wed. Sep 9, 2020 1:30 PM - 4:15 PM Z21

Hiroki Kondo(Nagoya University), Giichiro Uchida(Meijo Univ)

△：Presentation by Applicant for JSAP Young Scientists Presentation Award
▲：English Presentation
▼：Both of Above
No Mark：None of Above

+Add all to schedule

1:30 PM - 1:45 PM

[9p-Z21-1] Effect of Sonicated Pre-treatment for Plasma-functionalization on Multi-walled Carbon Nanotubes and Effect on Wear-resistance of the Nanotube-composite Material

〇DAISUKE OGAWA¹, KOHEI NISHIMURA¹, HIDEO UCHIDA¹, KEIJI NAKAMURA¹ (1.Chubu Univ.)

1:45 PM - 2:00 PM

△ [9p-Z21-2] Control of the Water-repellent by changing Nano-pillar Array Structures Fabricated by Bio-template Ultimate Etching

〇(M1)Sou Takeuchi¹, Daisuke Ohori^1,2,7, Teruhisa Ishida³, Masahiro Sota³, Yoshiyuki Nozawa⁴, Mikio Kadoi⁵, Kazuhiko Endo^1,6, Seiji Samukawa^1,6,7 (1.IFS, Tohoku Univ., 2.NCTU, 3.NAGASE & CO.,LTD., 4.SPT Co., 5.LTJ Corp, 6.AIST, 7.AIMR, Tohoku Univ.)

2:00 PM - 2:15 PM

[9p-Z21-3] Radical nitridation of silicon by wavelength-selectively excited gold nanoparticle plasmons

〇Takeshi Kitajima¹, Machiko Miyake¹, Shouma Kuwata¹, Toshiki Nakano¹ (1.Nat. Def. Acad.)

2:15 PM - 2:30 PM

△ [9p-Z21-4] Wall to wall distance dependence of carbon nanowalls for surface-assisted laser desorption/ionization mass spectrometry

〇Ryusei Sakai¹, Hiroki Kondo², Kenji Ishikawa², Naohiro Shimizu², Takayuki Ohta³, Mineo Hiramatsu³, Masaru Hori² (1.Nagoya Univ. Eng., 2.Nagoya Univ. Ctr. Low Temp. Plasma, 3.Meijo Univ.)

2:30 PM - 2:45 PM

△ [9p-Z21-5] Elucidation of local electrical conductivity in carbon nanowalls

〇(M2)Atsushi Ozaki¹, Hiroki Kondo³, Kenji Ishikawa³, Takayoshi Tsutsumi³, Mineo HIramatsu², Makoto Sekine³, Masaru Hori³ (1.Nagoya Univ. Eng., 2.Meijo Univ., 3.Nagoya Univ. Center for Low-temperature Plasma Sciences)

3:00 PM - 3:15 PM

△ [9p-Z21-6] Characterization of Li-ion battery using sputtered Si thin film as negative electrode material

〇(M1)Yuma Habu¹, Tomu Nagatomi¹, Junki Hayashi¹, Kenta Nagai¹, Giichiro Uchida^1,2 (1.Meijo Univ., 2.Ene Inst Meijo Univ.)

3:15 PM - 3:30 PM

[9p-Z21-7] Fabrication of Y-doped InN Films by Glancing-angle Reactive Sputtering

Suzuki Tsukasa¹, 〇Yoshiyuki Nakayama¹, Inoue Yasushi¹, Takai Osamu² (1.Chiba Inst. Technol., 2.Kanto Gakuin Univ.)

3:30 PM - 3:45 PM

▼ [9p-Z21-8] Synthesis of Cerium Oxide Nanoparticles by Non-thermal Plasma in slug flow reactor system

〇Wanying ZHU¹, Wahyu Diono¹, Hideki Kanda¹, Motonobu Goto¹ (1.Nagoya Univ.)

3:45 PM - 4:00 PM

△ [9p-Z21-9] Control of nano-structure of Ge thin films by Ar plasma sputtering and its application to Li-ion battery as negative electrode material

〇(M1)Junki Hayashi¹, Kenta Nagai¹, Yuma Habu¹, Giichiro Uchida^1,2 (1.Meijo Univ., 2.Ene Inst Meijo Univ.)

4:00 PM - 4:15 PM

△ [9p-Z21-10] Deposition of Ge thin film by He plasma sputtering and its application to Li-ion batteries

〇(M1)Kenta Nagai¹, Yuma Habu¹, Junki Hayashi¹, Giichiro Uchida^1,2 (1.Meijo Univ., 2.Ene Inst Meijo Univ.)

Sessions

8 Plasma Electronics » 8.3 Plasma nanotechnology