[10a-Z02-1~9] 15.4 III-V-group nitride crystals

△ [10a-Z02-5] Thermal oxidation of AlInN layer with low temperature by mist particle supply

〇(M1)Hiroki Matsumoto¹, Sho Iwayama¹, Norikatsu Koide¹, Mahito Odawara¹, Tetsuya Takeuchi¹, Satoshi Kamiyama¹, Motoaki Iwaya¹, Takahiro Maruyama¹, Isamu Akasaki^1,2 (1.Fac. Sci & Tec., Meijo Univ., 2.Akasaki Research Center, Nagoya Univ.)

Keywords:semiconductor, AlInN, oxidation