2020年第81回応用物理学会秋季学術講演会

講演情報

一般セッション(口頭講演)

6 薄膜・表面 » 6.4 薄膜新材料

[10a-Z05-1~11] 6.4 薄膜新材料

2020年9月10日(木) 08:30 〜 11:30 Z05

西川 博昭(近畿大)、西川 雅美(長岡技科大)、室谷 裕志(東海大)

11:00 〜 11:15

[10a-Z05-10] Deposition of Crystallized Yttria Stabilized Zirconia (YSZ) Films on Cellulose Nanopaper (CNP) Substrates at Low Temperature by Reactive Sputtering

〇(M2)Jyotish Patidar1、Susumu Horita1 (1.JAIST)

キーワード:Sputtering, YSZ, low temperature

Our research group has previously reported that yttria stabilized zirconia (YSZ) film is quite effective to stimulate crystallization of amorphous silicon (a-Si) at low temperature. A crystallized YSZ film can be deposited on a non-heat resistive cellulose nanopaper (CNP) substrate without any damage using DC magnetron sputtering with Ar and O2, which indicates a high possibility to fabricate a poly-Si TFT on CNP. CNP has been a promising substrate for fabrication of eco-friendly, cheap and flexible electronics. Previously, we have reported pre-sputtering and sputtering conditions to deposit crystallized YSZ on glass substrates. In this meeting, we further discuss deposition parameters and YSZ crystallization process on CNP in detail. Also, we discuss damage of CNP due to heat and plasma during the deposition process.