[11a-Z10-1~10] 13.3 絶縁膜技術

▲ [11a-Z10-5] Study on Deposition Mechanism of SiOx Films Produced by Silicone Oil and Ozone Gas

〇(M2)Weiqi Zhou¹、Susumu Horita¹ (1.JAIST)

キーワード：silicon oxide, CVD, FT-IR

Low-temperature SiOx films have been fabricated using APCVD method. In order to reduce the OH bonds content, we have studied the deposition mechanism. FT-IR method has been used to characterize the films.