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▲ [11p-Z01-3] Optical properties improvement of lightly and heavily boron-doped BaSi2 by atomic H passivation
Keywords:H passivation
Semiconducting BaSi2 has many advantages for solar cell applications, such as a suitable band gap of 1.3 eV, a large absorption coefficient of 3 × 104 cm-1 at 1.5 eV, and a large minority-carrier diffusion length of ca. 10 μm [1]. The first-principle calculation predicts Si vacancies to be most likely to occur as point defects in BaSi2 regardless of Si-rich or Si poor growth conditions and lead to the degradation of the minority-carrier properties of BaSi2[2]. Therefore, we try to passivate defects in undoped BaSi2 films by atomic hydrogen (H). The photoresponsivity of undoped BaSi2 films is enhanced markedly by irradiation of atomic H after the growth of BaSi2 films for 15 min thanks to the improvement of minority carrier lifetime [3]. The basic solar cell structure is pn junction. Thus, the passivation of impurity-doped p- or n-BaSi2 films is of particular importance. In this study, we investigate the effect of atomic H passivation on the photoresponsivity property of lightly (p = 7 × 1016 cm-3) and heavily (p = 3 × 1018 cm-3) boron (B) -doped p-BaSi2.