The 81st JSAP Autumn Meeting, 2020

Presentation information

Oral presentation

13 Semiconductors » 13.7 Compound and power electron devices and process technology

[11p-Z04-1~14] 13.7 Compound and power electron devices and process technology

Fri. Sep 11, 2020 1:00 PM - 4:45 PM Z04

Masashi Kato(Nagoya Inst. of Tech.)

3:30 PM - 3:45 PM

[11p-Z04-10] The Si-terminated 2DHG Diamond MOSFETs with the Normally-off operation and Wide Temperature Range Stability

〇(D)Te Bi1, Wenxi Fei1, Masayuki Iwataki1, Aoi Morishita1, Atsushi Hiraiwa1, Hiroshi Kawarada1,2 (1.Waseda Univ., 2.Kagami Memorial Research Inst. for Materials Science and Tech.)

Keywords:Diamond, Wide-bandgap semiconductor materials, Power device

Diamond exhibits excellent electrical properties such as high thermal conductivity about 22 kW m-1K-1, high breakdown field over 107 V/cm, and high bulk hole mobility of 2000 cm2 Vs-1. We have developed the H-terminated (C-H) diamond MOSFETs by using the two-dimensional hole gas (2DHG) .On the other hand, the electronegativity of Si is 0.7 Pauling unit lower than that of C, the different electronegativity (C: 2.5, Si: 1.8) C-Si dipole could more holes accumulate on the silicon termination diamond than the C-H(C: 2.5, H: 2.1) , the spontaneous polarization of C-Si dipole expects to induce the 2DHG which can used as the p-channel to fabricate the MOSFETs, and the SiO2 also is advantageous for power devices in terms of chemical stability and wide band gap. The SiO2 can be used as the gate insulator in the diamond power devices. In this work, Si-terminated (C-Si) diamond MOSFETs has been fabricated with the boron-doped p+ diamond selective growth by using the SiO2 as the mask for source and drain formation and the gate insulator and the C-Si diamond MOSFET achieved Normally-off operations and wide temperature range stability.