The 81st JSAP Autumn Meeting, 2020

Presentation information

Oral presentation

22 Joint Session M "Phonon Engineering" » 22.1 Joint Session M "Phonon Engineering"

[8a-Z09-1~10] 22.1 Joint Session M "Phonon Engineering"

Tue. Sep 8, 2020 9:00 AM - 11:45 AM Z09

Yoshiaki Nakamura(Osaka Univ.), Junichiro Shiomi(Univ. of Tokyo)

10:45 AM - 11:00 AM

[8a-Z09-7] High surface phonon-polariton thermal conductance along coupled films

Saeko Tachikawa1, Jose Ordonez-Miranda2, Yunhui Wu1, Laurent Jalabert1,3, Roman Anufriev1, Sebastian Volz1,3, Masahiro Nomura1 (1.IIS, Univ. of Tokyo, 2.Inst. Pprime, CNRS, 3.LIMMS/CNRS-IIS)

Keywords:Surface phonon-polaritons, Heat transfer, semiconductor material

We calculated the SPhP thermal conductance in SiO2/Si/SiO2 three-layer structure. We have found the coupling of SPhPs propagating along SiO2 nanolayers enhances the SPhP heat transport. The three-layer structure exhibits the SPhP thermal conductance higher than that of a single SiO2 film when SiO2 thicker than 150 nm, even ten times higher when SiO2 thicker than 600nm. This work proposes the structure that can outperform the in-plane thermal performance of a single suspended film while improving significantly its mechanical stability.