The 81st JSAP Autumn Meeting, 2020

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Oral presentation

6 Thin Films and Surfaces » 6.1 Ferroelectric thin films

[8p-Z17-1~12] 6.1 Ferroelectric thin films

Tue. Sep 8, 2020 1:00 PM - 4:15 PM Z17

Tomoaki Yamada(Nagoya Univ.), Takashi Nakajima(Tokyo Univ. of Sci.)

1:15 PM - 1:30 PM

[8p-Z17-2] Evaluation of chemical bonding state of AlScN using AR-XPS

〇Ryota Tsujiguchi1, Syorin Sai2, Kuniyuki Kakushima2, Hiroshi Nohira3 (1.Integrative Science and EngineeringTokyo City Univ., 2.Tokyo Institute of Technology., 3.Tokyo City Univ.)

Keywords:Ferroelectric thin films

We paid attention to AlScN, which is a promising ferroelectric material as a next-generation memory material.
A sample prepared by depositing AlScN on n+Si using the sputtering method was evaluated using X-ray photoelectron spectroscopy and X-ray reflectance method.