Fabrication of high-quality chalcogenide films using amorphous crystallization

Yuta Saito; Paul Fons; Alexander V. Kolobov; Kirill V. Mitrofanov; Kotaro Makino; Junji Tominaga

Presentation information

Oral presentation

16 Amorphous and Microcrystalline Materials » 16.1 Fundamental properties, evaluation, process and devices in disordered materials

[8p-Z26-1~23] 16.1 Fundamental properties, evaluation, process and devices in disordered materials

Tue. Sep 8, 2020 1:00 PM - 7:30 PM Z26

Tsuyoshi Honma(Nagaoka Univ. of Tech.), Akira Saitoh(Ehime Univ.), Tamihiro Gotoh(Gunma Univ.), Norimitsu Yoshida(Gifu Univ.)

2:30 PM - 2:45 PM

[8p-Z26-6] Fabrication of high-quality chalcogenide films using amorphous crystallization

〇Yuta Saito¹, Paul Fons^1,2, Alexander V. Kolobov^1,3, Kirill V. Mitrofanov¹, Kotaro Makino¹, Junji Tominaga¹ (1.AIST, 2.Keio Univ., 3.Herzen Univ.)

Keywords:chalcogenide, amorphous, sputtering

Fabrication of highly-oriented chalcogenide materials such as Sb₂Te₃ or Bi₂Te₃ will be demonstrated using a sputtering method via an amorphous-crystallization process.