[9a-Z05-1~8] 6.4 Thin films and New materials

[9a-Z05-1] Controlling Dark Current of NdF₃ Thin Films by Vacuum Annealing for Fabricating High Sensitivity Vacuum Ultraviolet Detector

〇Yusuke Horiuchi¹, Seiya Kato¹, Tomoki Kato¹, Masahiko Kase², Shingo Ono¹ (1.Nagoya Tech, 2.USHIO INC)

Keywords:thin film, pulsed laser deposition, fluoride

NdF₃ thin films were prepared by the pulsed laser deposition method, and the control of the dark current of NdF₃ thin films in a photoconductive detector by vacuum annealing process was evaluated. We conducted experiments on the effects of annealing temperature and effects of annealing time. I present changes in dark current and the compositional changes of thin films due to annealing.