The 81st JSAP Autumn Meeting, 2020

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15 Crystal Engineering » 15.5 Group IV crystals and alloys

[9p-Z12-1~19] 15.5 Group IV crystals and alloys

Wed. Sep 9, 2020 1:00 PM - 6:00 PM Z12

Kentarou Sawano(Tokyo City Univ.), Kaoru Toko(Univ. of Tsukuba)

5:30 PM - 5:45 PM

[9p-Z12-18] Channel direction dependence of hole mobility in strained Si/relaxed SiGe/Si(110) heterostructure p-MOSFET

〇(M1)Taisuke Fujisawa1, Atsushi Onogawa1, Daichi Namiuchi1, Yuichi Sano1, Daisuke Izumi1, Junji Yamanaka1, Kosuke Hara1, Kentarou Sawano2, Kiyokazu Nakagawa1, Keisuke Arimoto1 (1.Yamanashi Univ., 2.ARL Tokyo City Univ.)

Keywords:strained Si, hole mobility