The 81st JSAP Autumn Meeting, 2020

Presentation information

Oral presentation

7 Beam Technology and Nanofabrication » 7.3 Micro/Nano patterning and fabrication

[9p-Z25-1~6] 7.3 Micro/Nano patterning and fabrication

Wed. Sep 9, 2020 1:00 PM - 2:30 PM Z25

Jiro Yamamoto(Hitachi), Jun Taniguchi(Tokyo Univ. of Sci.)

1:15 PM - 1:30 PM

[9p-Z25-2] 3nm Soft X-ray Lithography using Laser Plasma Emission

Sho Amano1 (1.Univ. of Hyogo)

Keywords:soft X-ray lithography, laser plasma, solid argon

We demonstrated the 3 nm soft X-ray lithography using the solid-argon laser-plasma source we developed. The soft X-ray at 3.37 nm from the source was reflected and focused on the PMMA samples using the ellipsoidal mirror coated with NiCr/V2O5 multi-layers and the Ni-mesh (2000/inch) contact mask was used. The soft X-ray intensity on the samples was estimated to be 0.0065 mJ/cm2 and the etching depth was measured to be 130 nm after soft X-ray pulse exposure of 1000 shots.