Takuya Hizatsuki

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Speaker, Author, Co-Author

Thu. Mar 12, 2020 9:30 AM - 11:45 AM B410 (2-410)

Oral presentation
| 3 Optics and Photonics
| 3.7 Laser processing

[12a-B410-1~8] 3.7 Laser processing

9:45 AM - 10:00 AM

[12a-B410-2] Curved resist pattern formation using phase difference control in laser photolithography using coaxial interference pattern of optical vortices

〇(M2)Takuya Hizatsuki¹, Moritsugu Sakamoto¹, Kohei Noda¹, Nobuhiro Kawatsuki², Kimiaki Tsutsui³, Hiroshi Ono¹ (1.Nagaoka Univ. of Technol., 2.Hyogo Univ., 3.Nissan Chemical Corp.)

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