Ryota Nishimura

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Speaker, Author, Co-Author

Fri. Mar 13, 2020 9:00 AM - 10:30 AM A205 (6-205)

Oral presentation
| 8 Plasma Electronics
| 8.2 Plasma deposition of thin film, plasma etching and surface treatment

[13a-A205-1~6] 8.2 Plasma deposition of thin film, plasma etching and surface treatment

9:00 AM - 9:15 AM

[13a-A205-1] Study on plasma-enhanced chemical vapor deposition of DLC thin films at atmospheric pressure

〇Ryota Nishimura¹, Hiroyuki Yoshiki¹ (1.Tsuruoka Kosen)