[13a-A205-1~6] 8.2 Plasma deposition of thin film, plasma etching and surface treatment

[13a-A205-1] Study on plasma-enhanced chemical vapor deposition of DLC thin films at atmospheric pressure

〇Ryota Nishimura¹, Hiroyuki Yoshiki¹ (1.Tsuruoka Kosen)

Keywords:atmospheric-pressure microplasma, DLC films, Plasma CVD

Diamond-like carbon (DLC) films have attracted much attention because of its large hardness, excellent wear resistance, and high lubricant. In this study, setting the primary target for application to micromachines and MEMS, DLC films were locally synthesised at 1 atm by using atmospheric pressure μ plasma. By controlling He/CH₄/H₂ gas composition, and plasma input power, and deposition temperatre, DLC films with film hardness more than 20 GPa, and sp3/sp2 ratio more than 1.2 were obtained from the results of nano indentation test, XPS, FT-IR, Raman spectroscopy.