Takashi Onaya

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Speaker, Author, Co-Author

Sat. Mar 14, 2020 1:45 PM - 5:30 PM A303 (6-303)

Oral presentation
| Code-sharing Session
| 【CS.4】 Code-sharing Session of 6.1 & 13.3 & 13.5

[14p-A303-1~14] 【CS.4】 Code-sharing Session of 6.1 & 13.3 & 13.5

4:00 PM - 4:15 PM

[14p-A303-9] Endurance property of low-temperature (300 °C)-fabricated ferroelectric Hf_xZr₁_−xO₂ thin films using plasma-enhanced atomic layer deposition

〇Takashi Onaya^1,2,3,4, Toshihide Nabatame³, Yongchan Jung², Hernandez-Arriaga Heber², Jaidah Mohan², Harrison S. Kim², Ava Khosravi², Naomi Sawamoto¹, Takahiro Nagata³, Robert M. Wallace², Jiyoung Kim², Atsushi Ogura¹ (1.Meiji Univ., 2.UT Dallas, 3.NIMS, 4.JSPS Research Fellow DC)