Ma Shuaizhe

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Speaker, Author, Co-Author

Thu. Mar 12, 2020 9:30 AM - 11:30 AM PB4 (PB)

Poster presentation
| 13 Semiconductors
| 13.5 Semiconductor devices/ Interconnect/ Integration technologies

[12a-PB4-1~13] 13.5 Semiconductor devices/ Interconnect/ Integration technologies

9:30 AM - 11:30 AM

▲ [12a-PB4-13] Dependence of Thermal Boundary Resistance on Depositing Gas Ratio and Temperature at the Interface of Ru/TiN/SiO₂ and Ru/Al₂O₃/SiO₂

〇(M2)Ma Shuaizhe¹, Tianzhuo Zhan¹, Zhicheng Jin¹, Motohiro Tomita¹, Yen-Ju Wu², Yibin Xu², Takashi Matsukawa³, Takeo Matsuki^3,1, Takanobu Watanabe¹ (1.Waseda Univ., 2.National Institute for Materials Science, 3.National Institute of Advanced Industrial Science and Technology)