2:15 PM - 2:30 PM ▼ [12p-A202-5] Comparison of non-volatile memory characteristics for Hf-based MONOS diode with HfO2 and HfON tunneling layer 〇(D)Jooyoung Pyo1, Yusuke Horiuchi1, Shun-ichiro Ohmi1 (1.Tokyo Tech.)