Youya Wagatsuma

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Speaker, Author, Co-Author

Thu. Mar 12, 2020 1:45 PM - 4:15 PM D519 (11-519)

Oral presentation
| 15 Crystal Engineering
| 15.5 Group IV crystals and alloys

[12p-D519-1~10] 15.5 Group IV crystals and alloys

3:00 PM - 3:15 PM

△ [12p-D519-6] Suppression of crack formation in strained SiGe layer by patterning of Ge-on-Si substrates

〇Youya Wagatsuma¹, Md. Mahfuz Alam^1,2, Kazuya Okada¹, Yusuke Hoshi¹, Michihiro Yamada³, Kohei Hamaya³, Kentarou Sawano¹ (1.Adv. Res. Lab., Tokyo City Univ., 2.Univ. of Barishal, 3.CSRN, Osaka Univ.)

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