Erika Maeda

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Speaker, Author, Co-Author

Fri. Mar 13, 2020 9:00 AM - 11:45 AM B401 (2-401)

Oral presentation
| 13 Semiconductors
| 13.7 Compound and power electron devices and process technology

[13a-B401-1~10] 13.7 Compound and power electron devices and process technology

9:30 AM - 9:45 AM

△ [13a-B401-3] Influence of SiO₂ and HfO₂ initial growth layer on electrical properties

〇(M1)Erika Maeda^1,2, Toshihide Nabatame², Masafumi Hirose^1,2, Mari Inoue², Akihiko Ohi², Naoki Ikeda², Koji Shiozaki³, Hajime Kiyono¹ (1.SIT, 2.NIMS, 3.NU)