Shuichi Noda

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Speaker, Author, Co-Author

Sat. Mar 14, 2020 9:00 AM - 12:00 PM A305 (6-305)

Oral presentation
| 13 Semiconductors
| 13.4 Si processing /Si based thin film / MEMS / Equipment technology

[14a-A305-1~11] 13.4 Si processing /Si based thin film / MEMS / Equipment technology

11:15 AM - 11:30 AM

[14a-A305-9] TiN Film Characteristics Deposited by Minimal Fab Reactive Sputtering Tool (4)

〇Shuichi Noda¹, Kazuhiro Koga², Fumito Imura¹, Kazumasa Nemoto¹, Yuuki Yabuta³, Yamamoto Naoko³, Ryuichiro Kamei³, Sommawan Khumpuang^1,2, Shiro Hara^1,2 (1.AIST, 2.MINIMAL, 3.Seinan-Kogyo)

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