5:30 PM - 5:45 PM ▼ [14p-B401-15] Insulating Ga2O3 layer formation at SiO2/β-Ga2O3 interface during oxygen annealing at 1000℃ and its impact on Ga2O3 MOS interface characteristics 〇(M2)QIN MAO1, Koji KITA1 (1.Tokyo Univ.)