Influence of thermal dephasing in CsLiB<sub>6</sub>O<sub>10</sub> on DUV pico-second pulses generation (2)

Yoshiaki Miyagawa; Kuniaki Atagi; Ryota Murai; Yoshinori Takahashi; Yosuke Orii; George Okada; Makoto Nakajima; Yusuke Mori; Masashi Yoshimura

Presentation information

Oral presentation

3 Optics and Photonics » 3.5 Laser system and materials

[12a-B508-1~11] 3.5 Laser system and materials

Thu. Mar 12, 2020 9:00 AM - 12:00 PM B508 (2-508)

Nobuhiro Umemura(Chitose Inst. of Sci. & Tech.), Ryo Yasuhara(NIFS)

11:00 AM - 11:15 AM

[12a-B508-8] Influence of thermal dephasing in CsLiB₆O₁₀ on DUV pico-second pulses generation (2)

〇Yoshiaki Miyagawa¹, Kuniaki Atagi², Ryota Murai¹, Yoshinori Takahashi¹, Yosuke Orii³, George Okada³, Makoto Nakajima¹, Yusuke Mori², Masashi Yoshimura¹ (1.ILE, Osaka Univ., 2.Grad. Sch. of Eng., Osaka Univ., 3.Spectronix Corp.)

Keywords:deep-ultraviolet pico-second pulses, nonlinear optical crystal, thermal dephasing

Presentation information

[12a-B508-1~11] 3.5 Laser system and materials

[12a-B508-8] Influence of thermal dephasing in CsLiB6O10 on DUV pico-second pulses generation (2)

[12a-B508-8] Influence of thermal dephasing in CsLiB₆O₁₀ on DUV pico-second pulses generation (2)